What is the AG etching process for touch screen panels?

The morning sun shines through the glass window on your desk. You open your tablet to process your emails, only to find that the touch screen is heavily reflective and you have to adjust the angle repeatedly to see the content clearly - have you ever encountered such a problem? In fact, the above situation can be easily solved by using AG etching technology for touch screen panels.
 

As one of the earliest touch screen manufacturers in China to achieve mass production of AG etching, the engineering team of Shenzhen Xinlilai Touch Technology Co., Ltd.  is well versed in the impact of light control on user experience. The AG (Anti Glare) etching process forms precise concave convex structures on the surface of glass, converting direct light into diffuse reflection. This seemingly simple physical change has increased the visibility of the touch screen panels by over 60% in strong light environments.
 

Compared with traditional spraying processes, the haze layer formed by etching is integrally formed with the substrate. We use hydrofluoric acid solution for etching in a strictly controlled temperature and humidity environment. By adjusting the solution concentration and processing time, we can accurately achieve an adjustable haze range from 5% to 30%. Medical device manufacturers particularly favor this process because repeated wiping with disinfectant alcohol will not affect the anti glare effect.
 

Moreover, the etching process endows the touch screen panels with a unique tactile experience. When fingers slide on the surface of the touch screen, they will feel a subtle damping sensation, which not only avoids slipping, but also does not produce the dull feeling of ordinary frosted film. In the application of in car display screens, this feature significantly reduces visual distraction for drivers during operation.
 

However, achieving a perfect AG effect in touch screen panels is not an easy task. We have experienced the problem of "water ripples" caused by uneven etching, and ultimately solved this problem by developing multi-stage etching grooves and fluid dynamics simulation solutions, stabilizing the AG etching yield at over 98.5%.